Treated substrate having hydrophilic region and water repellent region, and process for producing it

ABSTRACT

A treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface; a process for producing a treated substrate, wherein the treated substrate can be produced with a low amount of light for a short time; wherein the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm; the process uses a hydrophilic substrate or makes the surface thereof hydrophilic, then forms a film containing the composition (A) on the surface, then forms said water repellent film by irradiating light on a part of the film surface to cure the composition (A) and then removes an uncured composition (A) present thereon in order to expose the hydrophilic surface.

This is a divisional application of U.S. application Ser. No.12/204,847, filed Sep. 5, 2008, which is a continuation ofPCT/JP07/054,290 filed on Mar. 6, 2007.

TECHNICAL FIELD

The present invention relates to a treated substrate having ahydrophilic region and a water repellent region on a surface of asubstrate, a process for producing it and a process for producing amember on which a pattern of a film made of a functional material isformed by using the treated substrate.

BACKGROUND ART

Many functional thin films are practically used in the fields ofsemiconductor devices, displays and luminescent elements. Functionalthin films are formed by disposing a material having a desired propertyat a desired position, followed by patterning. The functional thin filmsare used as wiring, electrodes, insulating layers, luminescence layers,optical thin films, etc.

For example, a photoresist pattern obtained by photolithography may bementioned. However, processes of the photolithography are complex, andutilization efficiency of energy, material, etc. is low. Further, thereis a problem such that since the processes of the photolithography arecarried out in a clean room, cost of facilities is expensive.

As a method to solve the problems of the photolithography, an ink-jetprint method has been proposed. However, in the ink-jet print method,position accuracy is low, and it is difficult to form a fine pattern.Under the circumstance, the following methods (1) and (2) have beenproposed to improve the position accuracy by preliminarily forming on asubstrate surface a base film having a water repellent region whichrepels ink and a hydrophilic region which accepts ink.

(1) A method wherein a photocatalyst such as titanium oxide is activatedat a time of exposure to change a wet property of a surfactant, or aphotocatalyst decomposable substance is decomposed and removed, therebyto form a pattern which accepts or repels printing ink or a toner(Patent Document 1). Paten Document 1 discloses that in a silicon resinhaving a siloxane bond (—Si—O—) as a main skeleton to be used as abinder for a photocatalyst, an organic group bonded to a silicon atom issubstituted with an oxygen-containing group by action of thephotocatalyst, whereby the wet property is improved.

(2) A method wherein a surface of a substrate is subjected to ahydrophilic treatment, and then a pattern of an organic monomolecularfilm of a fluorinated alkylsilane is formed by chemical vapordeposition, whereby the monomolecular film becomes a resist film foretching (Patent Document 2). Patent document 2 discloses a methodwherein hydrophilic treatment is carried out by irradiating a surface ofa substrate such as a single crystal silicon (natural oxidation surfaceSiO₂), a polyethylene film or glass with ultraviolet light of Xe₂excimer laser (172 nm) or oxygen plasma. Further, it is disclosed thatthe organic monomolecular film of a fluorinated alkylsilane is formed byapplying ultraviolet light (172 nm) or electron beam.

Patent Document 1 JP-A-11-344804

Patent Document 2 JP-A-2000-282240

DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention

In such conventional methods, high energy light having a wavelength oflower than 200 nm is required, and light irradiation for a long time isrequired. Further, special equipments such as a large facility, a vacuumapparatus and a high energy light source are required in suchconventional methods. Further, since a high energy light having awavelength of at most 200 nm is used, an organic compound in a thin filmof a pattern is also decomposed, and the contrast between a hydrophilicregion and a water repellent region in the pattern tends to be low.

It is an object of the present invention to provide a treated substratehaving a hydrophilic region and a water repellent region, of which thecontrast is high on a surface of a substrate. It is also an object ofthe present invention to provide a process for producing the treatedsubstrate, wherein a special equipment, high energy light or lightirradiation for a long time is not required, and the treated substratecan be produced with a low amount of light for a short time. Further, itis an object of the present invention to provide a member on which apattern of a film made of a functional material is formed by employingthe treated substrate.

Means to Accomplish the Objects

The above objects can be accomplished by the following invention.

(1) A treated substrate having a hydrophilic region and a waterrepellent region on a surface of a substrate, characterized in that thewater repellent region is made of a water repellent film formed bycuring the following composition (A) and having a film thickness of from0.1 to 100 nm:

composition (A): a composition comprising a photopolymerizationinitiator and a compound (a) having at least one polymerizablefunctional group selected from the group consisting of an acryloyl groupand a methacryloyl group, and a water repellent moiety.

(2) The treated substrate according to the above (1), wherein thecompound (a) is a compound represented by the following formula (11),(12), (21) or (22):

where each of Q¹ and Q² which are independent of each other, is amonovalent organic group, Q³ is an alkyl group having at least fourcarbon atoms, a monovalent organic group having the above alkyl group asa partial structure, a fluoroalkyl group having at least one carbonatom, which may contain an etheric oxygen atom, or a monovalent organicgroup having the above fluoroalkyl group as a partial structure, Q⁴ isan alkylene group having at least four carbom atoms, a bivalent organicgroup having the above alkylene group as a partial structure, afluoroalkylene group having at least two carbon atoms, which may containan etheric oxygen atom, or a bivalent organic group having the abovefluoroalkylene group as a partial structure, R¹ is a hydrogen atom or amethyl group, n is an integer of at least 0, and k is an integer of from1 to 5.(3) The treated substrate according to the above (1) or (2), wherein thecomposition (A) contains a compound (b) having at least threepolymerizable functional groups selected from the group consisting of anacryloyl group and a methacryloyl group, provided that the compound (b)may be the same as the compound (a) or a compound other than thecompound (a).(4) The treated substrate according to any one of the above (1) to (3),wherein the contact angle of the hydrophilic region to water is at most50°, and the contact angle of the water repellent region to water is atleast 80°.(5) The treated substrate according to any one of the above (1) to (4),wherein the hydrophilic region and the water repellent region have apredetermined pattern.(6) A process for producing a treated substrate, characterized by usinga hydrophilic substrate or carrying out a hydrophilic treatment on asurface of a substrate to make the surface hydrophilic, then forming afilm containing the following composition (A) on the surface, thenforming a water repellent film having a film thickness of from 0.1 to100 nm by applying light on a part of the film surface to cure thecomposition (A) and then removing an uncured composition (A) present onthe surface of the substrate in order to expose the hydrophilic surface,to obtain a treated substrate having a hydrophilic region and a waterrepellent region made of a water repellent film formed by curing thecompound (A) on the surface of the substrate:

composition (A): a composition comprising a photopolymerizationinitiator and a compound (a) having at least one polymerizablefunctional group selected from the group consisting of an acryloyl groupand a methacryloyl group, and a water repellent moiety.

(7) The process according to the above (6), wherein the surface of thesubstrate is subjected to the hydrophilic treatment by subjecting thesurface of the hydrophilic substrate to wet-washing or photo-washing, orby applying a hydrophilic compound on the surface of the substrate.(8) A process for producing a treated substrate, characterized byforming a film containing a hydrophilic compound and the followingcomposition (A) on a surface of a substrate, leaving it to stand stillto make the hydrophilic compound move to the substrate side, thenapplying light on a part of the film surface to cure the composition (A)to form a water repellent film having a film thickness of from 0.1 to100 nm, and then removing an uncured composition (A) present on thesurface of the substrate in order to expose a hydrophilic surface, toobtain a treated substrate having a hydrophilic region and a waterrepellent region made of a water repellent film formed by curing thecomposition (A) on the surface of the substrate:

composition (A): a composition comprising a photopolymerizationinitiator and a compound (a) having at least one polymerizablefunctional group selected from the group consisting of an acryloyl groupand a methacryloyl group, and a water repellent moiety.

(9) The process according to any one of the above (6) to (8), whereinlight having a wavelength of at least 200 nm is applied.(10) A process for producing a member on which a pattern of a film madeof a functional material is formed, characterized by applying ahydrophilic liquid containing a functional material on a surface of thetreated substrate as defined in the above (5) in order to coat thehydrophilic region having a pattern of the treated substrate with thehydrophilic liquid, followed by drying to form a pattern of a film madeof the functional material.(11) A process for producing a member on which a pattern of a film madeof a functional material is formed, characterized by applying ahydrophilic liquid containing a functional material on a surface of thetreated substrate as defined in the above (5) in order to coat thehydrophilic region having a pattern of the treated substrate with thehydrophilic liquid, followed by drying to form a pattern of a film madeof the functional material, and removing the water repellent film formedby curing the composition (A).

EFFECT OF THE INVENTION

By the present invention, a treated substrate having a hydrophilicregion and a water repellent region, of which the contrast is high onits surface can be obtained. Further, without using a large facility, avacuum apparatus and a high energy light source, the treated substratecan be produced. Namely, the treated substrate can be produced by usinga simple apparatus and a simple light source with a low light amount ina short time.

Further, by using the treated substrate of the present invention, amember on which a pattern of a film made of a functional material isformed can be obtained, and the treated substrate of the presentinvention can be used for various applications.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, a polymerizable functional group selected from the groupconsisting of an acryloyl group and a methacryloyl group is referred toas “(meth)acryloyl group”. Further, a (meth)acrylate means an acrylateor a methacrylate

In the present specification, a compound represented by the formula (11)is referred to as “compound (11)”. Compounds represented by otherformulae are also referred to in the same manner.

A substrate used in the present invention can be selected fromsubstrates made of glass; a silicon wafer; a metal such as Pd, Pt, Ru,Ag, Au, Ti, In, Cu, Cr, Fe, Zn, Sn, Ta, W or Pd; a metal oxide such asPdO, SnO₂, In₂O₃, PbO, or Sb₂O₃; a boride such as HfB₂, ZrB₂, LaB₂,CeB₆, YB₄ or GdB₄; a carbide such as TiC, ZrC, HfC, TaC, SiC or WC; anitride such as TiN, ZrN or HfN; a semiconductor such as Si or Ge; and aresin such as a polyimide, a polystyrene, a polyethylene terephtalate ora polytetrafluorethylene. The substrate may be a substrate made of ahydrophilic material, of which the surface is hydrophilic or a substratemade of a non-hydrophilic (hydrophobic) material, of which the surfaceis not hydrophilic. The glass, the silicon wafer, the metal oxide andthe polyimide are preferred. Among them, the glass, the silicon waferand the metal oxide are usually hydrophilic materials.

The shape of the substrate is not particularly limited and it preferablyhas a flat surface, a curved surface or a flat surface having apartially curved surface, and a flat surface is more preferred. Further,the area of the substrate is not particularly limited, and as far asconventional coating methods can be applied, the area of a substrate isnot limited. Further, the surface treatment of the substrate of thepresent invention is preferably carried out on one surface of a flatsubstrate.

The process for producing the treated substrate of the present inventioncontains the following step (1) or (2).

(1) Step of using a hydrophilic substrate or carrying out a hydrophilictreatment on a surface of a substrate to make the surface hydrophilicand then forming on the surface a film containing the composition (A)comprising a photopolymerization initiator and a compound (a) having atleast one (meth)acryloyl group, and a water repellent moiety.

(2) Step of forming a film containing a hydrophilic compound and thefollowing composition (A) on a surface of a substrate and leaving it tostand still to make the hydrophilic compound move to the substrate side.

After the above step (1) or (2), a part of the film surface isirradiated with light to cure the composition (A) to form a waterrepellent film having a film thickness of from 0.1 to 100 nm, and thenan uncured composition (A) present on the surface of the substrate isremoved to expose a hydrophilic surface, whereby the treated substrateof the present invention can be obtained.

First, the above step (1) will be explained. It is preferred to cleanthe surface of a substrate by washing or the like before use. Asubstrate made of a hydrophilic material and having a hydrophilicsurface can be used as it is. A substrate having a non-hydrophilicsurface is subjected to hydrophilic treatment before use. Thehydrophilic treatment can also be carried out on a surface of asubstrate having a hydrophilic surface before use. As a method forwashing the surface of a substrate, conventional methods for washing thesurface of plastics, metals, glass, ceramics, etc. can be employed. Asthe washing method, a method of wet-washing the surface of a substrate,a method of photo-washing the surface of a substrate or the like ispreferred. As a method for the hydrophilic treatment of the surface of asubstrate, conventional methods for hydrophilic treatment of the surfaceof plastics, metals, glass, ceramics, etc. can be employed. As thehydrophilic treatment method, a method wherein a compound which reactson the surface to form a hydrophilic surface is used, a method whereinthe surface of a substrate is coated with a hydrophilic compound to forma layer of the hydrophilic compound or a method wherein the abovemethods are combined may, for example, be mentioned.

For the wet-washing of a substrate, water, a water type detergent or anon-water type detergent (an organic solvent, a fluorine type solvent,etc.) may be used. Particularly, a method is preferred wherein asubstrate is washed with water or a water type detergent containing asurfactant, and then the substrate is dried, while contaminates,moisture, etc. on a surface are removed by using an organic solventhaving a low boiling point such as isopropyl alcohol or ethyl alcohol.Further, depending on the type of a substrate, or the type or degree ofstain, a step may be added, or a part of step may be omitted. It ispreferred that in order to wet-wash a substrate with an organic stain,the substrate is preliminarily washed with an organic solvent such asdichloropentafluoropropane (AK-225, manufactured by Asahi Glass Company,Limited: a mixture of CF₃CF₂CHCl₂ and CF₂CHClF) to remove the stain, andthen the substrate is immerse-washed with a water type detergent or anorganic detergent. At the time of the immerse-washing, ultrasonicwashing may be carried out in combination. In is the case of glass,instead of the immerse-washing or with the immerse-washing, a method ofpolish washing with an abrasive containing cerium oxide fine particles,followed by rinsing the substrate with pure water and then by air-dryingmay be employed.

As the method of photo-washing a substrate, UV/O₃ washing (photo-washingwith ultraviolet light, ozone or their combination) is preferred. Themechanism of the UV/O₃ washing is such that washing is carried out by(1) cleaving bonds of the main component (organic matter) of stain byultraviolet light having high photon energy, so that the bonds of thestain become fragile and (2) in such a state, reacting ozone or activeoxygen, so that the organic matter is oxidized to carbon dioxide, water,etc, and evaporated. Thus, the later method is preferred, sinceultraviolet light and ozone may be used alone or in combination to cleanthe surface. A commercially available UV/O₃ washing apparatus may beused.

Further, only by the wet-washing, fine organic stains (for example,residues of the surfactant in a detergent or suspended matters in theclean room) are likely to remain. On the other hand, the abovephoto-washing is free from the problem of the fine organic stains.Accordingly, a method is preferred wherein at first, relatively largestains are removed by the wet-washing, and then washing is carried outby the photo-washing.

The hydrophilic compound which may be used in the hydrophilic treatmentof the surface of a substrate may, for example, be a hydrophilic polymersuch as a poly(vinyl alcohol), a poly(vinyl pyrrolidone) or apoly(ethylene glycol) or a polyhydric alcohol such as glycerin,pentaerythritol or sorbitol. The compound which reacts on the surface tomake the surface hydrophilic may, for example, be a hydrolyzable silanecompound such as H—Si(OCH₂CH₃)₃ or NH₂CH₂CH₂CH₂—Si(OCH₂CH₃)₃, a compoundhaving said compound partially or entirely hydrolyzed or a hydrolyticcondensate of the above compound.

It is preferred that the hydrophilic compound is applied in the form ofa solution dissolved in a solvent and dried to form a layer of thehydrophilic compound. The hydrophilic polymer and the polyhydric alcoholare preferably dissolved in water and used as an aqueous solution. Thehydrolyzable silane compound is preferably dissolved in an alcoholsolvent such as isopropyl alcohol for use. The concentration of thehydrophilic polymer or the hydrolyzable silane compound in the solutionis preferably from 0.01 to 10 mass %, more preferably from 0.1 to 1 mass%.

The coating method of a substrate is not particularly limited, and aspin coating method, a dip coating method, a spray coating method, aroll coating method, a meniscus coating method and a screen printing ismethod may be employed.

In a case where the surface of a substrate is made of various differentmaterials, it is preferred to employ a method of subjecting the surfaceof a substrate to hydrophilic treatment. Because, the same hydrophilicproperty can be imparted to the surface made of various materials.

Next, a film containing the composition (A) is formed on the hydrophilicsurface of the substrate. The composition (A) contains aphotopolymerization initiator and a compound (a) having at least one(meth)acryloyl group and a water repellent moiety. The (meth)acryloylgroup of the compound (a) may be at any position in the molecule,however, it is preferably present at a terminal of the molecule. If itis present at a terminal of the molecule, reactivity is high.

The water repellent moiety of the compound (a) is preferably amonovalent or bivalent water repellent group. The monovalent waterrepellent group is preferably a monovalent group having anorganopolysiloxane skeleton, an alkyl group having at least four carbonsor a C₁₋₁₂ fluoroalkyl group which may contain an etheric oxygen atom.The bivalent water repellent group is preferably a bivalent group havingan organopolysiloxane skeleton, an alkylene group having at least fourcarbons or a C₂₋₁₂ fluoroalkylene group which may contain an ethericoxygen atom.

The organopolysiloxane skeleton has a polysiloxane skeleton and anorganic group bonded to a silicon atom which forms the skeleton. Theorganic group bonded to a silicon atom is bonded by a carbon-siliconbond. Namely, a terminal atom of the organic group, which is bonded to asilicon atom is a carbon atom. At least one organic group is bonded tothe silicon atom in the organopolysiloxane skeleton, and in many cases,except for a terminal silicon atom, one or two organic groups are bondedto the silicon atom. In the case of the monovalent group having anorganopolysiloxane skeleton, at most three organic groups are bonded toa terminal silicon atom. In the present invention, theorganopolysiloxane skeleton preferably has a linear structure having nobranch or a linear structure having a few branches.

The organic group bonded to the above silicon atom is preferably ahydrocarbon group or a fluoroorganic group. The hydrocarbon group ispreferably an alkyl group, an alkenyl group, an alkynyl group or an arylgroup. From the viewpoint of availability, the organic group bonded to asilicon atom is preferably an alkyl group having at most four carbonatoms, an alkenyl group having at most four carbon atoms, an alkynylgroup having at most four carbon atoms or an aryl group having at most 8carbon atoms. Among them, a methyl group, an ethyl group and a phenylgroup are preferred, and the methyl group is particularly preferred.Further, from the viewpoint of improving the water repellent property ofthe organopolysiloxane skeleton, the organic group bonded to a siliconatom is preferably a C₅₋₂₀ linear alkyl group or a C₅₋₂₀ linear alkenylgroup, particularly preferably a C₆₋₁₆ linear alkyl group. Further, fromthe viewpoint of improving the water repellent property of theorganopolysiloxane skeleton, the organic group bonded to a silicon atomis preferably a fluoroorganic group, and a polyfluoroalkyl group whichmay contain an etheric oxygen is more preferred. Particularly preferredare a polyfluoroalkyl group having a difluororoethylene chain and apolyfluoroalkyl group having a perfluorooxyalkylene group.

The compound (a) may, for example, be a compound having one(meth)acryloyl group and a monovalent water repellent group or acompound having two (meth)acryloyl groups and a bivalent water repellentgroups. The former compound may, for example, be the compound (11) orthe compound (12), and the latter compound may, for example, be thecompound (21) or the compound (22). The symbols in the formulae are thesame as defined above.

In the case of the compound (11), the water repellent moiety is amonovalent group having an organopolysiloxane skeleton, in the case ofthe compound (12), the water repellent moiety is Q³, in the case of thecompound (21), the water repellent moiety is a bivalent group having anorganopolysiloxane skeleton, and in the case of the compound (22), thewater repellent moiety is Q⁴.

In the above formulae, each of Q¹ and Q² which are independent of eachother, is a monovalent organic group, preferably a monovalenthydrocarbon group which may contain a fluorine atom, more preferably aC₁₋₄ alkyl group, particularly preferably a methyl group. In a casewhere a plurality of Q¹ are present (in a case where n is at least 2),the plurality of Q¹ may be different from one another. The same appliesto Q².

R¹ is a hydrogen atom or a methyl group. n is an integer of at least 0,preferably an integer of at least 1, and preferably an integer such thatthe molecular weight of a compound will be from 500 to 1,000,000. k isan integer of from 1 to 5, preferably an integer of from 2 to 4, morepreferably 3.

In the above formulae, Q³ is an alkyl group having at least four carbonatoms, a monovalent organic group having the above alkyl group as apartial structure, a fluoroalkyl group having at least one carbon atom,which may contain an etheric oxygen atom or a monovalent organic grouphaving the above fluoroalkyl group as a partial structure.

In a case where Q³ is an alkyl group having at least four carbon atomsor a monovalent organic group having the above alkyl group as a partialstructure, an alkyl group having at least four carbon atoms ispreferred, and a C₄₋₁₈ alkyl group is more preferred. In a case wherethe number of carbon atoms is within the above range, an excellent waterrepellent property can be obtained. The alkyl group may have a linearstructure, a branched structure, a ring structure or a partial ringstructure, and the linear structure is preferred.

As examples of Q³ which is the alkyl group having at least four carbonatoms, the following may be mentioned.

H(CH₂)₄—, H(CH₂)₆—, H(CH₂)₈—, H(CH₂)₁₀—, H(CH₂)₁₂—, H(CH₂)₁₄—,H(CH₂)₁₆—, H(CH₂)₁₈—

In a case where Q³ is a fluoroalkyl group having at least one carbonatom, which may contain an etheric oxygen atom or a monovalent organicgroup having the above fluoroalkyl group as a partial structure, a grouprepresented by R^(f1)—Y— is preferred (R^(f1) is a fluoroalkyl grouphaving at least one carbon atom, which may contain an etheric oxygenatom, and Y is a bivalent coupling group containing no fluorine atom).

R^(f1) is preferably a C₁₋₁₂ fluoroalkyl group which may contain anetheric oxygen atom, more preferably a C₁₋₁₂ perfluoroalkyl group whichmay contain an etheric oxygen atom, particularly preferably a C₃₋₁₂perfluoroalkyl group which may contain an etheric oxygen atom. Thestructure of R^(f1) may be a linear structure, a branch structure, aring structure or a partial ring structure, and the linear structure ispreferred.

As specific examples of R^(f1), the following groups may be mentioned.

F(CF₂)₄—, F(CF₂)₆—, F(CF₂)₈—, H(CF₂)₄—, H(CF₂)₆—, H(CF₂)₈—;CF₃CF₂OCF₂CF₂OCF₂—, CF₃CF₂OCF₂CF₂OCF₂CF₂—,CF₃CF₂OCF₂CF₂OCF₂CF₂OCF₂CF₂OCF₂—, CF₃CF₂OCF₂CF₂OCF₂CF₂OCF₂CF₂OCF₂CF₂—;CF₃CF₂CF₂OCF₂—, CF₃CF₂CF₂OCF₂CF₂—, CF₃CF₂CF₂OCF(CF₃)—, CF₃CF₂CF₂OCF(CF₃)CF₂—, CF₃CF₂CF₂OCF(CF₃) CF₂OCF₂CF₂—, CF₃CF₂CF₂OCF(CF₃)CF₂OCF(CF₃)—,CF₃CF₂CF₂OCF(CF₃) CF₂OCF(CF₃) CF₂—.

Y is preferably a group represented by —(CF₂)_(m)—, —SO₂NR²—(CH₂)_(m)—or —(c═O)—NR²—(CH₂)_(m)—. m is an integer of from 1 to 5, and R² is ahydrogen atom, a methyl group or an ethyl group.

Q⁴ may be an alkylene group having at least four carbom atoms, abivalent organic group having the above alkylene group as a partialstructure, a fluoroalkylene group having at least two carbon atoms,which may contain an etheric oxygen atom, or a bivalent organic grouphaving the above fluoroalkylene group as a partial structure.

In a case where Q⁴ is an alkylene group having at least four carbomatoms or a bivalent organic group having the above alkylene group as apartial structure, an alkylene group having at least four carbom atomsis preferred, and a C₄₋₁₈ alkylene group is more preferred. Such groupsare excellent in the water repellent property. The alkylene group mayhave a linear structure, a branch structure, a ring structure or apartial ring structure, and the linear structure is preferred.

As specific examples in a case where Q⁴ is an alkylene group having atleast four carbom atoms, the following groups may be mentioned.

(CH₂)₄—, —(CH₂)₆—, —(CH₂)₈—, —(CH₂)₁₀—, —(CH₂)₁₂—, —(CH₂)₁₄—, —(CH₂)₁₆—,—(CH₂)₁₈—.

In a case where Q⁴ is a fluoroalkylene group having at least two carbonatoms, which may contain an etheric oxygen atom or a bivalent organicgroup having the above fluoroalkylene group as a partial structure, aC₂₋₁₂ fluoroalkylene group which may contain an etheric oxygen atom ispreferred, and a C₂₋₁₂ perfluoroalkylene group which may contain anetheric oxygen atom is more preferred.

The fluoroalkylene group which may contain an etheric oxygen atom mayhave a linear structure, a branch structure, a ring structure or apartial ring structure, and the linear structure is preferred.

As specific examples in a case where Q⁴ is a fluoroalkylene group havingat least two carbon atoms, which may contain an etheric oxygen atom, thefollowing groups may be mentioned.

(CF₂)₂—, —(CF₂)₄—, —(CF₂)₆, —(CF₂)₈,—(CF₃)CF[OCF₂CF(CF₃)]OCF₂(CF₂)₄CF₂O[CF(CF₃)CF₂O]CF(CF₃)—,—CF₂CF₂OCF₂(CF₃)CF₂[OCF₂CF(CF₃)]OCF₂—,—(CF₂)₄CF₂O[CF(CF₃)CF₂O]CF(CF₃)CF₂OCF₂CF₂—.

The compound (a) is preferably the compound (11), the compound (12) orthe compound (21). In view of the excellent water repellent property, itis more preferred to use the compound (11) wherein each of Q¹ and Q² isa methyl group, the compound (21) wherein Q¹ is a methyl group or thecompound (12) wherein Q³ is a group represented by R^(f1)—Y—, and R^(f1)is a C₁₋₁₂ perfluoroalkyl group, are preferably used.

Further, in the case of the compound (11) wherein each of Q¹ and Q² is amethyl group or the compound (21) wherein Q¹ is a methyl group, acompound having a molecular weight of from 500 to 1,000,000 isparticularly preferred, and the compound having a molecular weight offrom 1,000 to 1,000,000 is especially preferred. The compound (11) orthe compound (21) is usually available as a mixture of two or morecompounds, of which n is different. n may sometimes be represented by anaverage value of n in the mixture, and in such a case, n is a positivenumber. In the compound (11) or the compound (21), if the molecularweight is at least 500, evaporation from the surface of a substrate canbe prevented, and if the molecular weight is lower than 1,000,000, thesolubility of the compound to a solvent is improved, whereby the workefficiency is improved.

The photopolymerization initiator is a substance which absorbs light andgenerates radicals to initiate the polymerization reaction and isselected from substances which initiate the polymerization of a(meth)acryloyl group.

For example, 2-hydroxy-2-methyl-1-phenylpropan-1-one (Dalocure 1173,manufactured by Merck Ltd.), 1-hydroxy-cyclohexyl-phenyl-ketone(Irgacure 184, manufactured by CIBA-GEIGY Limited),1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one (Dalocure 1116,manufactured by Merck Ltd.), benzodimethyl ketal (Irgacure 651,manufactured by CIBA-GEIGY Limited),2-methyl-1-(4-methylthio)phenyl-2-morphorlinopropanon-1-one (Irgacure907, manufactured by CIBA-GEIGY Limited),2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl) butanone-1 (Irgacure369, manufactured by CIBA-GEIGY Limited) or 2,4-diethyl thioxanthone(KAYACURE DETX, manufactured by Nippon Kayaku Co., Ltd.) may preferablymentioned. They may be used alone or as a mixture of two or more. Theamount of the photopolymerization initiator is preferably from 0.1 to 50mass %, more preferably from 1 to 10 mass %, based on the total amountof the compound (a).

The compound (A) preferably contains a compound (b) having at leastthree (meth)acryloyl groups, provided that the compound (b) may be thesame as the compound (a) or a compound other than the compound (a).Namely, the compound (b) which is the compound (a) means a compoundhaving at least three (meth)acryloyl groups and a water repellentmoiety, and the compound (b) which is other than the compound (a) meansa compound having at least three (meth)acryloyl groups and no waterrepellent moiety. Use of the compound (b) having at least three(meth)acryloyl groups is effective to accelerate the curing of thecomposition (A).

The compound (b) which is other than the compound (a) is preferably apoly(meth)acrylate which is a tri or more valent polyol. The number ofthe (meth)acryloyl groups in one molecule is preferably at most 8.Specifically, pentaerythritol tri(meth)acrylate, pentaerythritoltetra(meth)acrylate, dipentaerythritol penta(meth)acrylate,dipentaerythritol hexa(meth)acrylate, trimethylolpropanetri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate or the likemay be mentioned. The amount of the compound (b) which is other than thecompound (a) in the composition (A) is preferably from 0.1 to 100 mass%, more preferably from 5 to 50 mass %, based on the total amount of thecompound (a). If the amount of the compound (b) is excessive, the waterrepellent property of a water repellent region of a film formed bycuring the composition (A) may sometimes deteriorate.

Next, the above step (2) will be explained. The composition (A) is mixedwith the above hydrophilic compound, and the surface of a substrate iscoated with the mixture to form a film, followed by leaving it to standstill to make the hydrophilic compound move to the substrate side. Sincethe compound having a hydrophilic moiety is a material of a high energysurface, it orientates to the substrate side, and since the compoundhaving a water repellent moiety is a material of a low energy surface,it tends to orientate to the gas phase interface. By utilizing suchcharacteristics, it is possible to form a bilayer structure of thehydrophilic compound and the compound (a).

The amount of the hydrophilic compound is preferably from 0.1 to 100mass %, more preferably from 1 to 60 mass %, based on the amount of thecompound (a). Condition to leave the substrate to stand still ischanged, depending on the type of the compound (a), the type of thehydrophilic compound and the film thickness. A substrate coated with amaterial may be heated to accelerate this phenomenon. By heating anapplied hydrophilic compound and/or compound (a) to at least a glasstransition temperature, a bilayer structure can be formed in a shorttime at a level of from a few seconds to a few minutes.

Instead of the hydrophilic compound, a compound which reacts to asurface to make the surface hydrophilic may be used, and the compound ismade to be moved to the surface of the substrate in the same manner andreacted with the substrate surface so that the substrate surface becomeshydrophilic. The amount of the compound or condition to use the compoundis the same as in the case of the hydrophilic compound.

The composition (A) in the step (1) and the hydrophilic compound, thecomposition (A), etc. in the step (2) are applied preferably in the formof a solution containing a solvent. The solvent is preferably an alcoholsuch as methanol, ethanol or isopropanol, an ester such as ethyl acetateor butyl acetate or a hydrocarbon such as hexane. The solid componentconcentration in the solution is preferably from 0.01 to 50 mass, morepreferably from 0.1 to 10 mass %.

As a method to form a film, a method to coat a substrate surface withthe above solution is preferred, and a spin coating method, a dipcoating method, a wire bar coating method, a blade coating method or aroll coating method may be employed. The coating may be carried out atroom temperature or under heating. Further, a substrate on which a filmhas been formed is preferably dried under nitrogen stream or the like.The drying is preferably carried out at room temperature. In a casewhere the drying is carried out under heating, it is preferred thattemperature and time are adjusted, depending on the heat resistance ofthe material of a substrate.

After a film is formed, a part of the film is irradiated with light.Light used for irradiation preferably has a wavelength of at least 200nm, more preferably a wavelength of at least 300 nm. Further, lighthaving a wavelength of at most 380 nm is preferred, and light having awavelength of at most 365 nm is more preferred. When the wavelength oflight is at least 200 nm, decomposition of a substrate can be preventedin most cases. Further, a photopolymerization initiator which initiatepolymerization with light having a wavelength of at most 380 nm iseasily available, and the light source is also not expensive.Irradiation time is properly changed, depending on the wavelength oflight, the intensity of light, the type of light, the type of thecomposition (A), etc. In a case of an ultrahigh-pressure mercury lamp,irradiation time is from 5 to 120 seconds with from 2 to 100 mw/cm². Ingeneral, irradiation time with a high-pressure mercury lamp is shorterthan that with an ultrahigh-pressure mercury lamp.

As the light source, a low-pressure mercury lamp, a high-pressuremercury lamp, an ultrahigh-pressure mercury is lamp, a xenon lamp, asodium lamp, a gas laser such as nitrogen, a liquid laser of an organicdye solution or a solid-state laser having a rare earth element ioncontained in an inorganic single crystal may, for example, be mentioned.Further, as a light source other than a laser capable of providing amonochromatic light, an ultraviolet light having a desired wavelength,which is obtained by subjecting a broadband line spectrum or acontinuous spectrum to an optical filter such as a band-pass filter anda cut-off filter, may be used. Since a large area can be irradiated withlight at once, a high-pressure mercury lamp or an ultrahigh-pressuremercury lamp is preferred as the light source.

Light irradiation is preferably carried out through a photomask. By thismethod, the curing reaction can be carried out only at a desired regionon a film surface, and a treated substrate on which a desired pattern ofa hydrophilic region and a water repellent region is formed can beobtained.

The atmosphere for light irradiation can be optionally selected. In acase where a water repellent film having a thickness of at most 100 nmis formed by curing the composition (A), since cure inhibition due tooxygen may sometimes occur, light irradiation is preferably carried outunder an inert gas atmosphere such as nitrogen. The inert gas may, forexample, be a gas selected from nitrogen, argon, helium and carbondioxide, and nitrogen gas is preferred, since it is inexpensive.

Light irradiation may be carried out from either side of a substrate, aslong as light has a wavelength which can transmit through a substrate.Usually, it is preferred to apply light from the side of a filmcontaining the composition (A).

After a water repellent film is formed by curing the composition (A), anuncured composition (A) remained on the substrate surface is removed. Byremoving the uncured composition (A), a hydrophilic surface is exposed.As a method for removing the uncured composition (A), in a case wherethe molecular weight of the composition (A) is low, it is preferred toremove the uncured composition (A) by blowing nitrogen stream. In a casewhere the molecular weight of the composition (A) is high, since thecomposition (A) is not likely to evaporate, it is preferred to wash thesurface on which the uncured composition (A) remains with an organicsolvent. The organic solvent to be used for washing is preferably asolvent which dissolves the composition (a). The organic solvent may,for example, be an alcohol such as methanol, ethanol or isopropanol, anester such as ethyl acetate or butyl acetate or a hydrocarbon such ashexane.

The film thickness of the water repellent film is from 0.1 to 100 nm,preferably from 0.1 to 50 nm, more preferably from 0.1 to 10 nm.Particularly, in a case where the treated substrate of the presentinvention is is used for an electronic member, a thin water repellentfilm is preferred. A member on which a pattern of a film made of afunctional material is formed by coating a surface of the treatedsubstrate of the present invention with a hydrophilic solutioncontaining a functional material to coat the hydrophilic region of thetreated substrate on which a pattern is formed with the hydrophilicliquid, followed by drying to form a pattern of a film made of thefunctional material, and removing the water repellent film formed bycuring the composition (A). The member is useful for an electronicelement. The water repellent film formed by curing the composition (A)is removed, because in a case where the member is used for an electronicelement, the water repellent film may influence the operation of theelement. Accordingly, a thin water repellent film is preferred from theviewpoint of removing the film easily.

By the present invention, a treated substrate having a hydrophilicregion and a water repellent region made of a water repellent filmformed by curing the composition (A) on a surface of a substrate, can beprovided. The hydrophilic region can be distinguished from the waterrepellent region by contact angle to water. In the presentspecification, the contact angle is represented by a measured valueobtained by a sessile drop method. The contact angle to water of thehydrophilic region is preferably at most 50°, more preferably at most40°, is particularly preferably at most 20°. The contact angle to waterof the water repellent region is preferably at least 80°, morepreferably at least 100°, particularly preferably at least 110°. Thedifference in the contact angle to water between the water repellentregion and the hydrophilic region is preferably at least 40°, morepreferably at least 70°. The larger the difference is, the higher thecontrast of the pattern can be obtained.

Further, in a case where a fluorine-containing compound is used as thecompound (a), the water repellent region also has an oil repellentproperty. The oil repellent region can repel a lipophilic solvent (suchas a hydrocarbon solvent), whereby if a lipohilic solvent is used as asolvent for a functional material for forming a functional film, it canbe prevented that the water repellent region is stained with thefunctional material. Further, it is possible to impart affinity to alipophilic solvent to the hydrophilic region. The oil repellent regioncan be distinguished from the hydrophilic region by contact angle tohydrocarbon compounds. Specifically, in a case where hexadecane is usedas a hydrocarbon compound, the contact angle to hexadecane of thelipophilic region is preferably at least 40°, more preferably at least60°, particularly preferably at least 70°.

In the production of the treated substrate of the present invention, iflight or laser for photopolymerization is applied though a photomask ata time of light irradiation, a treated substrate on which a desiredpattern of a hydrophilic region and a water repellent region is formedcan be obtained. Further, it is possible to form a pattern such thatwidth between the hydrophilic region and the water repellent region isat most 10 μm.

A member on which a pattern of a film made of a functional material isformed can be produced by applying a hydrophilic liquid containing afunctional material on a surface of the treated substrate of the presentinvention in order to coat the hydrophilic region of the treatedsubstrate on which a pattern is formed with the hydrophilic liquid,followed by drying.

The functional material may, for example, be a metal particles-dispersedpaste for forming metal wiring, a pigment material for forming a colorfilter, a ceramic material for forming an electronic device or anorganic display or a semiconductor material.

The hydrophilic liquid containing a functional material means a liquidwherein a functional material is dissolved in water or a high polarorganic solvent. A high polar organic solvent which is miscible withwater is more preferred.

The coating method may, for example, be a coating method such as a spincoating, a dip coating, wire bar coating, blade coating or roll coatingor a printing method for a specific region such as screen printing orinkjet printing. Among them, from the viewpoint of selectively coating anon-water repellent region on a pattern of a water repellent region anda hydrophilic region, screen printing or inkjet printing is preferred.

The drying is preferably carried out in atmosphere, nitrogen stream orthe like. Further, the drying is preferably carried out at roomtemperature or under heating. In a case where the drying is carried outunder heating, it is preferred that the temperature and time areoptionally changed, depending on the heat resistance of a material of asubstrate.

As mentioned above, for electronic elements, a member on which a patternof a film made of a functional material is formed and of which waterrepellent film is removed is useful. It is preferred that the waterrepellent film is removed by carrying out an UV/O₃ treatment on themember. For example, it is preferred that PL7-200 (manufactured by CENTENGINEERING CO., LTD.) is used, and a member is irradiated for from 1 to3 minutes.

In a case where the treated substrate of the present invention isstained with a hydrophilic ink as a functional material, the member canbe used as a stump. Further, in a case where a pattern of a hydrophilicregion and a water repellent region is preciously formed, it can be usedas a stump for microcontact printing.

Further, in a case where a flexible substrate such as a plasticsubstrate is used as a substrate, by irradiating the substrate withlight by installing plural rolls and an exposure apparatus between theplural rolls so that Roll to Roll method can be carried out, aphoto-treated substrate can be obtained with a high throughput.

EXAMPLES

Now, the present invention will be described in further detail withreference to Examples, but it should be understood that the presentinvention is by no means restricted thereto.

The contact angle to water was measured by putting water droplets on 3different spots on a surface of a substrate to be measured, and eachdroplet was measured in accordance with JIS R3257 “sessile drop testmethod of a glass substrate surface”. The droplet was 2 μL/droplet, andthe measurement was carried out at 20° C. The contact angle isrepresented by an average value of 3 droplets (n=3).

Example 1 Substrate Wash

A 5 cm² silicon wafer was washed with ethanol and then washed withUV/O₃.

Preparation of a Coating Solution

2.5 g of isopropanol was added in a sample vessel. 0.1 g of a 10 mass %isopropanol solution of a polydimethyl siloxane having methacryloyloxypropyl groups at both terminals (DMS-R18, manufactured by Gelest, Inc.,the compound of the formula (21) wherein R¹ is a methyl group, Q¹ is amethyl group, k is 3, and the molecular weight is from 4,500 to 5,500)was added to the sample vessel. 0.2 g of a 1 mass % isopropanol solutionof trimethylol propane triacrylate was added. 0.06 g of a 1% isopropanolsolution of IRGACURE 369 (manufactured by CIBA-GEIGY Limited) was addedas a photopolymerization initiator. The sample vessel was shaken a fewtimes to mix the solution.

Coating with a Solution

The silicon wafer was coated with the prepared coating solution by spincoating under a condition of 3000 rpm for 20 seconds, and a film wasformed.

Light Irradiation

A surface of the obtained film was irradiated with ultraviolet light ofa high-pressure mercury lamp at 5 mw/cm² for 15 seconds under nitrogenatmosphere from the film side through a photomask having a pore patternof 2.5 cm×5 cm.

Substrate Wash

After the light irradiation, the substrate was rinsed with isopropanol,then rinsed with ethanol and dried under nitrogen stream, whereby atreated substrate was obtained.

Film Thickness Measurement

The film thickness of the obtained treated substrate was measured byAtomic Force Microscope (AFM), and as a result, the thickness of thewater repellent film was 8 nm.

Measurement of Contact Angle

With respect to the surface of the treated substrate obtained by theabove step, the contact angle to water was 28° at a non-irradiated partand 100° at an ultraviolet light irradiated part. Therefore, a waterrepellent-hydrophilic pattern having a hydrophilic region (contactangle: 28°) and a water repellent region (contact angle: 100°) wasconfirmed. The film thickness of the water repellent region was 38 nm.

Example 2

The same operation was carried out as in Example 1, except thatIRAGARACURE 907 (manufactured by CIBA-GEIGY Limited) was used, insteadof IRAGARACURE 369. The thickness of the obtained film was 8 nm.

The contact angle to water of the obtained treated substrate was 21° ata non-irradiated part and 100° at an ultraviolet light irradiated part.Therefore, a water repellent-hydrophilic pattern having a hydrophilicregion (contact angle: 21°) and a water repellent region (contact angle:100°) was confirmed.

Example 3

The same operation was carried out as in Example 2, except that 0.5 g ofa 1% aqueous solution of a polyvinyl alcohol (molecular weight: 500,manufactured by KANTO CHEMICAL CO., INC.) was added to a coatingsolution, and after spin coating, the substrate was left to stand stillfor 5 minutes. The thickness of the obtained film is estimated to beabout 12 nm.

The contact angle to water of the obtained treated substrate was 29° ata non-irradiated part and 100° at an ultraviolet light irradiated part.Therefore, a water repellent-hydrophilic pattern having a hydrophilicregion (contact angle: 29°) and a water repellent region (contact angle:100°) was confirmed.

Example 4

The same operation was carried out as in Example 2, except that beforethe substrate is coated with a coating solution, the substrate wascoated with 2 mL of a 1 mass % aqueous solution of a polyvinyl alcohol(molecular weight: 500, manufactured by KANTO CHEMICAL CO., INC.) byspin coating (3,000 rpm, 20 seconds). The thickness of the obtained filmwas estimated to be about 12 nm.

The contact angle to water of the obtained treated substrate was 29° ata non-irradiated part and 100° at an ultraviolet light irradiated part.Therefore, a water repellent-hydrophilic pattern having a hydrophilicregion (contact angle: 29°) and a water repellent region (contact angle:100°) was confirmed.

Example 5

0.1 g of NH₂CH₂CH₂CH₂—Si(OCH₂CH₃)H₃ (manufactured by is Shin-EtsuChemical Co., Ltd.) was dissolved in 100 g of isopropanol, and 0.025 gof distilled water was added thereto, followed by stirring at roomtemperature for 20 hours to obtain an amino silicone solution.

The same operation was carried out as in Example 2, except that beforethe substrate is coated with a coating solution, the substrate wascoated with 20 mL of the above prepared amino silicon solution by spincoating (3,000 rpm, 20 seconds). The thickness of the obtained film wasestimated to be about 15 nm.

The contact angle to water of the obtained treated substrate was 11° ata non-irradiated part and 102° at an ultraviolet light irradiated part.Therefore, a water repellent-hydrophilic pattern having a hydrophilicregion (contact angle: 11°) and a water repellent region (contact angle:102°) was confirmed.

Example 6

The same operation was carried out as in Example 1, except that insteadof IRAGACURE 369, IRAGACURE 907 was used, instead of trimethylol propanetriacrylate, dipentaerythritol hexaacrylate was used, and instead of thenitrogen atmosphere, light irradiation was carried out under airatmosphere. The thickness of the obtained film was about 8 nm.

The contact angle to water of the obtained treated substrate was 19° ata non-irradiated part and 100° at an ultraviolet light irradiated part.Therefore, a water repellent-hydrophilic pattern having a hydrophilicregion (contact angle: 19°) and a water repellent region (contact angle:100°) was confirmed.

INDUSTRIAL APPLICABILITY

According to the production process of the present invention, a finepattern having a hydrophilic region and a water repellent region can beformed without employing a large facility, a vacuum apparatus and alight source. In a case where a functional ink is spread on the patternby using an ink-jet, since only a hydrophilic region is coated with thefunctional ink, and a water repellent region is not coated with thefunctional ink, patterning can be carried out on a substrate with afunctional ink. Further, the present invention can also be applied forforming electronic device circuits. Further, a thin film having a waterrepellent-hydrophilic pattern can be used as a stump for micro contactprinting, by dyeing a hydrophilic region with a functional ink andtranscribing it.

Further, a treated substrate having a hydrophilic region and a waterrepellent region on a surface can be used in a medical field. Forexample, a mask having a pattern such that a blood vessel of a capillaryvessel corresponds to a hydrophilic part is prepared, and a pattern of acapillary vessel is printed on a substrate. Vascular endothelial cellsare spread thereon, and the cells grow only on the hydrophilic region,whereby a pattern of a capillary vessel can be regenerated.

Further, in a case where a compound wherein the compound (a) having awater repellent property and no oil repellent property (for example, afluorine-containing hydrocarbon water repellent compound) is used, sincea water repellent region is also a lipophilic region, an oil ink can becontained at the lipophilic region, and a substrate can be used as aplatemaker for print.

Further, in the treated substrate of the present invention having ahydrophilic region and a water repellent region on a surface of asubstrate, by utilizing a reactivity of a hydroxyl group, etc. on asurface of a hydrophilic region, a compound having another property canreact on the surface of the hydrophilic region, whereby a substratehaving a water repellent property and another property can be formed.

The entire disclosure of Japanese Patent Application No. 2006-059495filed on March 6, including specification, claims and summary isincorporated herein by reference in its entirety.

1. A process for producing a treated substrate, comprising using ahydrophilic substrate or carrying out a hydrophilic treatment on asurface of a substrate to make the surface hydrophilic, then forming afilm comprising the following composition (A) on the surface, thenforming a water repellent film having a film thickness of from 0.1 to100 nm by applying light on a part of the film surface to cure thecomposition (A) and then removing an uncured composition (A) present onthe surface of the substrate in order to expose the hydrophilic surface,to obtain a treated substrate having a hydrophilic region and a waterrepellent region made of a water repellent film formed by curing thecompound (A) on the surface of the substrate: composition (A): acomposition comprising a photopolymerization initiator and a compound(a) having at least one polymerizable functional group selected from thegroup consisting of an acryloyl group and a methacryloyl group, and awater repellent moiety.
 2. The process according to claim 1, wherein thesurface of the substrate is subjected to the hydrophilic treatment bysubjecting the surface of the hydrophilic substrate to wet-washing orphoto-washing, or by applying a hydrophilic compound on the surface ofthe substrate.
 3. The process according to claim 1, wherein light havinga wavelength of at least 200 nm is applied.
 4. The process according toclaim 1, wherein composition (A) additionally comprises a compound (b)having at least three polymerizable functional groups selected from thegroup consisting of an acryloyl group and a methacryloyl group, providedthat the compound (b) may be the same as the compound (a) or a compoundother than the compound (a).
 5. The process according to claim 1,wherein the compound (a) is a compound represented by the followingformula (11), (12), (21) or (22):

where each of Q¹ and Q² which are independent of each other, is amonovalent organic group, Q³ is an alkyl group having at least fourcarbon atoms, a monovalent organic group having the above alkyl group asa partial structure, a fluoroalkyl group having at least one carbonatom, which may contain an etheric oxygen atom, or a monovalent organicgroup having the above fluoroalkyl group as a partial structure, Q⁴ isan alkylene group having at least four carbon atoms, a bivalent organicgroup having the above alkylene group as a partial structure, afluoroalkylene group having at least two carbon atoms, which may containan etheric oxygen atom, or a bivalent organic group having the abovefluoroalkylene group as a partial structure, R¹ is a hydrogen atom or amethyl group, n is an integer of at least 0, and k is an integer of from1 to
 5. 6. The process according to claim 1, wherein the contact angleof the hydrophilic region to water is at most 50°, and the contact angleof the water repellent region to water is at least 80°.
 7. The processaccording to claim 1, wherein the substrate is selected from the groupconsisting of glass, silicon, metal oxide and polyimide.
 8. A processfor producing a treated substrate, comprising forming a film comprisinga hydrophilic compound and the following composition (A) on a surface ofa substrate, leaving it to stand still to make the hydrophilic compoundmove to the substrate side, then applying light on a part of the filmsurface to cure the composition (A) to form a water repellent filmhaving a film thickness of from 0.1 to 100 nm, and then removing anuncured composition (A) present on the surface of the substrate in orderto expose a hydrophilic surface, to obtain a treated substrate having ahydrophilic region and a water repellent region made of a waterrepellent film formed by curing the composition (A) on the surface ofthe substrate: is composition (A): a composition comprising aphotopolymerization initiator and a compound (a) having at least onepolymerizable functional group selected from the group consisting of anacryloyl group and a methacryloyl group, and a water repellent moiety.9. The process according to claim 8, wherein light having a wavelengthof at least 200 nm is applied.
 10. The process according to claim 8,wherein composition (A) additionally comprises a compound (b) having atleast three polymerizable functional groups selected from the groupconsisting of an acryloyl group and a methacryloyl group, provided thatthe compound (b) may be the same as the compound (a) or a compound otherthan the compound (a).
 11. The process according to claim 8, wherein thecompound (a) is a compound represented by the following formula (11),(12), (21) or (22):

where each of Q¹ and Q² which are independent of each other, is amonovalent organic group, Q³ is an alkyl group having at least fourcarbon atoms, a monovalent organic group having the above alkyl group asa partial structure, a fluoroalkyl group having at least one carbonatom, which may contain an etheric oxygen atom, or a monovalent organicgroup having the above fluoroalkyl group as a partial structure, Q⁴ isan alkylene group having at least four carbon atoms, a bivalent organicgroup having the above alkylene group as a partial structure, afluoroalkylene group having at least two carbon atoms, which may containan etheric oxygen atom, or a bivalent organic group having the abovefluoroalkylene group as a partial structure, R¹ is a hydrogen atom or amethyl group, n is an integer of at least 0, and k is an integer of from1 to
 5. 12. The process according to claim 8, wherein the contact angleof the hydrophilic region to water is at most 50°, and the contact angleof the water repellent region to water is at least 80°.
 13. The processaccording to claim 8, wherein the substrate is selected from the groupconsisting of glass, silicon, metal oxide and polyimide.
 14. A processfor producing a member on which a pattern of a film made of a functionalmaterial is formed, comprising applying a hydrophilic liquid comprisinga functional material on a surface of a treated substrate having ahydrophilic region and a water repellent region, wherein the hydrophilicregion and the water repellent region have a predetermined pattern, inorder to coat the hydrophilic region with the hydrophilic liquid,followed by drying to form a pattern of a film made of the functionalmaterial, wherein the water repellent region comprises a water repellentfilm formed by curing the following composition (A) and having a filmthickness of from 0.1 to 100 nm: composition (A): a compositioncomprising a photopolymerization initiator and a compound (a) having atleast one polymerizable functional group selected from the groupconsisting of an acryloyl group and a methacryloyl group, and a waterrepellent moiety.
 15. The process according to claim 14, whichadditionally comprises removing the water repellent film formed bycuring the composition (A) after the drying to form a pattern of a filmmade of the functional material.